BEDE D1 SYSTEM *HIGH RESOLUTION X-RAY DIFFRACTION, *GRAZING INCIDENCE REFLECTIVITY *THIN FILM POWDER DIFFRACTION Introduction The Bede D1 System is new self-contained, flexible research diffractometer, designed to give all the most popular elements of a high resolution research diffractometer, within the price range of a quality control system. This is made possible by advanced design and state-of-the-art components, for example the specimen and detector axes use motors and encoders which give an accuracy of 0.18 arcsecond precision. As the D1 is self contained in an X-ray safety enclosure with integral safety interlocks, it is ideally suited to universities and industrial process development laboratories working on thin film of metals, polymers, ceramics and semiconductors and on epitaxial compound semiconductors. Combined with the range of Bede accessories and software, the Bede D1 System gives you the power to achieve:
· Single and Double Crystal Diffraction · Parallel-beam optic XRD for Thin Film Polycrystalline films · Powder diffraction with Bragg-Bretano geometry · High Resolution XRD for epilayer measurement · Triple Axis HRXRD for Reciprocal Space Mapping(separating the effects of crystal tilts and mismatch from stress) · Bond and Bowen-Tanner lattice parameter measurement methods · Grazing incidence X-ray reflectivity · Grazing incidence X-ray diffuse scatter · Texture Mapping
Bede QC200 X-ray Diffractometer X-RAY DIFFRACTION AND WAFER MAPPING
Introduction A development of the highly successful Bede QC2a, the QC200 is a high-resolution double crystal diffractometer with 200mm wafer mapping capabilities, aimed at providing the highest quality data with the maximum throughput of samples. The QC200, together with quick and simple 200mm wafer mapping capabilities, also allows access to asymmetric X-ray reflections for the measurement of relaxed systems and samples with highly mis-oriented substrates. The QC200 is aimed at providing the highest quality data with the maximum throughput of samples. The QC200 diffractometer is totally integrated in a cabinet, requires only mains electricity services and takes up a minimum of floor space, making it the ideal instrument for quality analysis of a wide range of semiconductor substrates and epitaxial layers in a clean room environment. A range of generator options is available to maximise the sample throughput. Outstanding features of this instrument are: · Compact High Resolution Scanning Diffractometer for Process Control · The new Microsource X-ray generator allowing upgrade to high-brightness sub-mm spot sizes · Horizontal specimen mounting no adhesives required · Rapid sample throughput · Complete 200mm wafer mapping capability · Asymmetric reflections accessible with new motorised detector axis · Pre-Aligned reference crystal supplied in quick-change block · Completely self contained in radiation safe freestanding cabinet · Bede Control Windows instrument control software
