DE400D 电子束蒸发真空镀膜仪 | ||||||||||||||||||||||||||
The DE400D Electron Beam Evaporator is assembled with one e-beam source, the substrate is mounting on the top of the chamber and rotary or on the horizontal axial on the side of chamber for the substrate polar to change the deposition angle DE400D电子束蒸发仪配置一个电∞子束蒸发源,基片架装于腔体顶部旋转或腔体侧面水平转动的轴上基片可以改变镀膜角度
Configuration 主要配置
Specification 主要技术指标
Typical Application典型应用
For R&D Thin Film Deposition 用于薄膜沉积研发
Ideal tools for LIFT-OFF process 用于LIFT-OFF工艺的理想平ㄨ台
Ideal tools for GLAD process with side mount substrate stage 若采用侧装样品台可用成为GLAD工艺∮的理想平台
Evaporate metal, Semiconductor or Insulation Materials (material depends) 可蒸发金属〓,半导体或介↘质材料(视具体材料而定)
Evaporate Magnetic Materials 可蒸发磁性材←料 |