Good Film Uniformity and repeatability
很好的薄膜均匀性∏和重复性
Safety interlock for critical components
关键部件安全互锁保护
Configuration
主要配置
Magnetron Sputter Chamber 溅射真空腔室 | D shape, 304 stainless steel chamber with viewport 磁控溅射腔体为304不锈钢,并有观察窗 |
Vacuum Pumping 真空泵 | Turbo pump and dry rough pump with sputter chamber 溅射室配备分子泵和无油机械泵 |
Vacuum Valve 真空阀门 | Pneumatic operation high vacuum and isolation gate valves 气动控制高真空和隔离插板阀门 Chamber Vent Valve, Rough and Foreline angle valve, and gas valve 腔体充气阀门,粗抽和前级角阀,气体截止阀 |
Sputtering Sources 溅射源 | Four 4” circle magnetron sputtering sources 4个4英寸圆形磁控溅射源 Each source with Pneumatic shutter 每个源配备手动挡板 The power supply can be DC, pulse DC or RF power supply 电源可以配备直流,脉冲直流或射频电源 |
Sample Stage 样品台
| Substrate linear motion, rotating, and the sample heating or water cooling, Up to 6” substrate with Pneumatic substrate shutte 样品台直线升【降和旋转,样品可加热或冷却,最大6英寸基片装载能力,配气动样品挡板 |
Vacuum Gauging 真空测量 | Wide range vacuum gauge and Pirani rough gauge 宽量程真空计用于测量真空和皮拉尼粗抽计 |
Pressure Control 压力控制 | Three Mass flow controller 三路流量计 Capacitance manometer for sputter process pressure control 一个压力计实现溅射压力控制 |
Cooled Water Interlock 冷水√安全互锁 | There are cooled water flow sensors of interlock to protect sputter sources work properly 溅射源冷却水路配水流传感器对溅射源安全互锁保护 |
Load Lock | Option O2 reactive, RF plasma cleaning, single or multi substrate loading 可选, 通氧反应,射频等离子体清洗, 单基片或多基片装载能力 |
Specification
主要技术指标
Sputter Chamber Size 磁控溅射腔体尺寸 | 450mm wide x 430mm deep x 450mm high 450mm宽430mm深450mm高 |
The Base Vacuum Pressure in Sputter Chamber 溅射腔体极限真空度 | better than 5E-8 Torr 优于5E-8托 |
Sample Loading Capacity 装样能力 | Max. 6 inch flat substrate 最大6英寸的平板基片 |
The Max. Temperature of the Sample Heater 样品加热器最高温度 | 1000C 1000度 |
The film uniformity 膜厚均匀性 | better than +/-3% over a rotating 4 inch Silicon wafer 在旋转的4英寸硅基片上的膜厚均匀性由于+/-3% |
General Sputtering Pressure 通用溅射压力 | 1-5 mTorr 1至5毫托 |
德仪(DE)科技有限公司专业进口美国磁控溅射、电子束蒸发、热蒸发和脉冲激光真空薄膜沉积设备,以及磁控溅射源/电源、电子束蒸发源、溅射靶材和蒸发材料、阀门、真空计和流量计、真空密封穿导件等各种真空部件。十几年来,凭着高端的品质,先进的技术和周到的技术服务,德仪公司的产品为中国的知名高校、科研院所及企业的薄膜沉积工作提供了有力的支持。
我们期待为您提供最适合您使用的真空薄膜沉积设备和部件!