Configuration
主要配置
|
Evaporation Chamber 蒸发腔体 |
304 stainless steel chamber with viewport 蒸发腔体为304不锈钢，并有观察窗◤ |
|
Vacuum Pumping 真空泵 |
Cryo-pump or Turbo pump and dry rough pump 配备冷凝泵或分子泵和无油机械泵 |
|
Vacuum Valve 真空阀门 |
Pneumatic HV gate valves 气动控制高真空插板阀 |
|
Evaporation Source 蒸发源 |
Multi pocket e-beam source 多坩埚电子束蒸发源 |
|
Optional Load Lock chamber 样品室 |
304 stainless steel chamber with viewport 蒸发腔体为304不锈钢，并有观察窗 |
|
Sample Stage 样品台 |
Top mount and rotary or Side mount polar Substrate 顶部安装旋转的样品台或侧面安装的转角样品台 |
|
Film Control 膜厚检测 |
Crystal Film thickness Monitor and Control 晶振膜厚监控≡ |
|
Vacuum Gauging 真空测量 |
Wide range vacuum gauge and rough gauge 宽量程真空计用于测量真空和粗抽计 |
Specification
主要技术指标
|
The Base Vacuum Pressure 极限真空度 |
better than 3E-8 Torr 优于3E-8托 |
|
Sample Loading Capacity 装样能力 |
One Max. 8 inch flat substrate or multi small substrate 一个最大8英寸的平板基片或多个小基片 |
|
Rate Resolution 蒸发速率分辨率 |
0.05 Angstroms/sec |
|
Thickness Resolution = 0.02 Angstroms 膜厚●分辨率 |
0.02 Angstroms
|
|
Features 特点
D shape Chamber of front open door for easy inside operation D型腔体前开门便于腔体内部操作和维护
Stand along system frameworks and electric rack 独立的系统机架和电器柜
System and e-beam source Water Interlock 系统和电子束蒸发源冷水安全互锁
Optional Substrate Cooling or heating 样品台可选水冷或加热
|
For R&D Thin Film Deposition
用于薄膜沉◣积研发
Ideal tools for LIFT-OFF process
用于LIFT-OFF工艺的理想平ξ 台
Ideal tools for GLAD process with side mount substrate stage
若采用侧装样品台可用成为GLAD工艺的理想平台
Evaporate metal, Semiconductor or Insulation Materials (material depends)
可蒸发金◥属，半导体或介质材料（视具体材≡料而定）
Evaporate Magnetic Materials
可蒸发磁↘性材料
