| 技术参数 | ||
| 高分辨 X 射线摇摆曲线 对称、非对称反射，准禁 002 反射测量 组成、厚度、驰豫（ relaxation ）、倾斜（ tilt ）测量 基底材料缺陷、 offcut 测量 用于 外延材料，量子阱、超晶格结构， III-V 、 II-VI 、 IV-IV 半导体材料， LEDs/ HBTs/ HEMTs 及激光器结构表征及质量控制 GaN 类 LEDs 、激光器结构， SiGe 类 HBT 结构测量 | ||
| 主要特点 | ||
| 200mm （ 8” ）扫描 适合于洁净室使用（ 100 级） 测角仪达到 1.0 arcsecond 分辨率 配 Microsource™光源 微区分析 | ||
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| Introduction A development of the highly successful Bede QC2a, the QC200 is a high-resolution double crystal diffractometer with 200mm wafer mapping capabilities, aimed at providing the highest quality data with the maximum throughput of samples. The QC200, together with quick and simple 200mm wafer mapping capabilities, also allows access to asymmetric X-ray reflections for the measurement of relaxed systems and samples with highly mis-oriented substrates. The QC200 is aimed at providing the highest quality data with the maximum throughput of samples. The QC200 diffractometer is totally integrated in a cabinet, requires only mains electricity services and takes up a minimum of floor space, making it the ideal instrument for quality analysis of a wide range of semiconductor substrates and epitaxial layers in a clean room environment. A range of generator options is available to maximise the sample throughput. Outstanding features of this instrument are: • Compact High Resolution Scanning Diffractometer for Process Control • The new Microsource X-ray generator allowing upgrade to high-brightness sub-mm spot sizes • Horizontal specimen mounting no adhesives required • Rapid sample throughput • Complete 200mm wafer mapping capability • Asymmetric reflections accessible with new motorised detector axis • Pre-Aligned reference crystal supplied in quick-change block • Completely self contained in radiation safe freestanding cabinet • Bede Control Windows instrument control software |
