技术参数 | ||
技术参数 1.样品轴范围:235°, 分辨率:0.00005° 2.探测器轴范Ψ围:205°,分辨率:0.00005° 3.样品X-Y-Z范围:150×150mm/9mm,分辨率5um 4.样品倾动(chi角):135°,分辨率:0.003° 5.样品旋转(phi角):正负360°,分辨率:0.004° | ||
主要特点 | ||
主要特点 1.适用于单晶外延膜,多晶薄膜,粉末材料,包括半导体、金属、陶瓷、高分子聚合物,医药等 2.高分辨XRD,三轴XRD,掠入射,小角X射线衍射和反射,织构应力分析等 3.可←同时配双光源,其中电子束聚焦microsource源强度极╲高,可进行微区分析 4.强大的模拟分∞析软件,优异的操作软件 5.PC控制光路ζ调整调协,自动化程度高 | ||
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BEDE D1 SYSTEM *HIGH RESOLUTION X-RAY DIFFRACTION, *GRAZING INCIDENCE REFLECTIVITY *THIN FILM POWDER DIFFRACTION Introduction The Bede D1 System is new self-contained, flexible research diffractometer, designed to give all the most popular elements of a high resolution research diffractometer, within the price range of a quality control system. This is made possible by advanced design and state-of-the-art components, for example the specimen and detector axes use motors and encoders which give an accuracy of 0.18 arcsecond precision. As the D1 is self contained in an X-ray safety enclosure with integral safety interlocks, it is ideally suited to universities and industrial process development laboratories working on thin film of metals, polymers, ceramics and semiconductors and on epitaxial compound semiconductors. Combined with the range of Bede accessories and software, the Bede D1 System gives you the power to achieve: • Single and Double Crystal Diffraction • Parallel-beam optic XRD for Thin Film Polycrystalline films • Powder diffraction with Bragg-Bretano geometry • High Resolution XRD for epilayer measurement • Triple Axis HRXRD for Reciprocal Space Mapping(separating the effects of crystal tilts and mismatch from stress) • Bond and Bowen-Tanner lattice parameter measurement methods • Grazing incidence X-ray reflectivity • Grazing incidence X-ray diffuse scatter • Texture Mapping |