R&D Sources are engineered for optimum performance:
Wide pressure range operation to 10-9 Torr
Feature low outgassing
Excellent thin film uniformity and deposition rates
Efficient sputter target utilization
No special sputter target requirements (thermal pastes, keepers, etc. not required)
Compact, modular magnet array
Magnets NOT exposed to vacuum
Magnets NOT exposed to cooling water
Full line of accessories available (gas injection, chimneys, shutters, cluster arrays, etc.)
Custom sputter source configurations available
良好薄膜均匀性和材料利用率；
集成的气体注入口，可将气体直接导入↓靶表面；
可选择的罩和挡板设计，最大可能减∞少镀膜过程污染；
高强度稀土磁铁阵列可溅射磁性和非磁性材料
DE公司提供美☉国进口高纯度靶材，单质、贵重金属、合金和金属化合物、碳化物、氟化物、硅化物、硼化物、硒化物、硫化物和碲化物、氧化物，利用率高，质量上乘，部分现货，价位合理，欢迎来电来函洽谈！
